1. Product Introduction of Planar sputtering targets
Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.
We supply:
Round sputtering target
Plate sputtering target
U-type sputtering targets
Cylindrical sputtering targets
Planar sputtering targets
Rotatable sputtering targets
Customized sputtering targets
2. Materials and standard of planar Sputtering target:
Typical Materials:
Aluminum Al, Aluminum-Titanium Al-Ti, Chromium Cr, Chromium-Molybdenum Cr-Mo, Copper Cu, Copper alloy, Indium Tin oxide (ITO), Silver Ag, Tungsten W, Molybdenum Mo, Molybdenum-Tungsten Mo-W, Molybdenum-Niobium Mo-Nb, Tantalum Ta, Silicon Si.
3. Features of our planar sputtering target:
Qualified products
Very good price
Short delivery time
High performance
Samples supported
Small orders supported
4. Application of planar sputtering target
Flat Panel Display, Large Area Coating, Photovoltaics Decorative Coating, Crystal Oscillator, Magnetic Storage, Optical Discs, Optoelectronics, Semiconductor ,Wear-Resistant Coating
5. Details of planar sputtering target
|
Titanium plate target |
||
|
Normal Size |
Material |
Composition |
|
12*132*1701mm |
Ti Gr1 |
99.70% |
|
13*132*1701mm |
Ti Gr2 |
99.50% |
|
12*170*830mm |
Ti 4N Ti |
99.99% |
|
8*133*410mm |
Zr702 |
Zr+Hf>99.2% |
|
8*158*1108mm |
Ta 1 |
99.95% |
|
10*159*1519mm |
Nb1 |
99.95% |
|
18*152*635mm |
2NCr |
99.50% |
|
20*190*740mm |
3NCr |
99.90% |
6. Delivery of planar sputtering target
We can delivery the products according to the order situation,usually 3-25 days.
7.Payment terms
8.Shipping Methods
