Titanium Sputtering Targets| High Purity 99.99% Disc or Plate with Bolt Down or ASTM B 265 Gr2 Targets

Titanium Sputtering Targets| High Purity 99.99% Disc or Plate with Bolt Down or ASTM B 265 Gr2 Targets

Titanium sputtering targets available purity can meet 99.99%,the density of titanium is 4.506-4.516g/cm³

Description

1. Product Introduction of titanium sputtering target

 

Titanium sputtering targets available purity can meet 99.99%,the density of titanium is 4.506-4.516g/cm³, melting point is 1668,boiling point is 3535. With professional technical and advanced equipment, our targets has been win many good reputation from all over of the world.

We supply:

Titanium round sputtering target

Titanium plate sputtering target

 

2. Materials and standard of titanium Sputtering target:

Material

Gr2,99.9%,99.99%

Standard

ASTM B265, ASTM B348

 

3. Features of our titanium sputtering target

   Qualified products

   Very good price

   Short delivery time

   High performance

   Samples supported

   Small orders supported

 

4. Application of titanium sputtering target

Widely used in Petroleum, oil and gas industry, chemical industry, Chlao-Akali industry, petro-chemical related plants.

 

5. Details of titanium sputtering target

Titanium round target

Titanium plate target

Normal Size

Material

Composition

Normal Size

Material

Composition

Dia40×17mm

Gr1
Gr2
4N Ti

99.7%
99.5%
99.99%

12×132×1701mm

Gr1
Gr2
4N Ti

99.7%
99.5%
99.99%

Dia63×32mm

13×132×1701mm

Dia62×38mm

12×170×830mm

Dia100×32mm

8×133×410mm

Dia100×40mm

8×158×1108mm

Dia100×45mm

10×159×1519mm

Dia152.4×42mm

18×152×635mm

Dia105×16mm

20×190×740mm

Dia160×12mm


 

6. Delivery of titanium sputtering target

We can delivery the products according to the order situation,usually 3-25 days.


7.Payment terms 


8.Shipping Methods


9.Packing Details

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